300 kV RIB Injector Platform

This schematic diagram shows the RIB high voltage platform as viewed from above. The platform supports electrostatic beam optic elements, the first stage mass analyzing magnets (M/DM~1000) and a charge exchange cell. The entire platform shown above is designed to operate at 300 kV for optical compatibility with the existing stable ion injector to the tandem accelerator. Normally, however, the RIB platform operates at 200 kV for ease of operation since no significant losses in transport efficiency are observed at the lower operating voltage. The electronic control components of the platform are located on another high voltage platform which is radiologically isolated in an adjacent room (not shown). The target/ ion source assembly is electrically isolated from the platform to voltages up to 60 kV (40 kV nominally) to provide the extraction potential for the ion source. The target/ion source itself is contained in a vacuum enclosure which can be ‘unplugged’ from the beam line and transported to a set of shielded casks in a radiologically secure area. A remote handling system consisting of a robotic manipulation arm, automated conveyer and gantry crane allows highly activated and contaminated enclosures to be transported to storage. Another important aspect of the removable target/ ion source module is that it allows a particular source to be developed and out gassed in a separate test area such as our off-line test facility , on-line test facility or a dedicated out gassing chamber. Here is a beam optics simulation of the beam line shown above. Since the tandem accelerator requires negative ions, a charge exchange cell is placed between the second and third quadruples on the platform when positive ion sources are used.


RIB Injector | Target | Ion Source | HV Platform | Charge Exchange Cell | Isobar Separator | Beam Development

HRIBF

This page was last updated on February 11, 1999

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