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RIB High Voltage Platform |
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This schematic diagram shows the RIB high voltage platform as viewed from
above. The platform supports electrostatic beam optic elements, the first
stage mass analyzing magnets (M/ΔM~1000) and
a charge exchange cell. The entire platform shown above is designed to
operate at 300 kV for optical compatibility with the existing stable ion
injector to the tandem accelerator. Normally, however, the RIB platform
operates at 200 kV for ease of operation since no significant losses in
transport efficiency are observed at the lower operating voltage. The electronic
control components of the platform are located on another high voltage
platform which is radiologically isolated in an adjacent room (not shown).
The target/ ion source assembly is electrically isolated from the platform
to voltages up to 60 kV (40 kV nominally) to provide the extraction potential
for the ion source. The target/ion source itself is contained in a
vacuum
enclosure which can be ‘unplugged’ from the beam line and transported
to a set of shielded casks in a radiologically secure area. A
remote
handling system consisting of a robotic manipulation arm, automated
conveyer and gantry crane allows highly activated and contaminated enclosures
to be transported to storage. Another important aspect of the removable
target/ ion source module is that it allows a particular source to be developed
and out gassed in a separate test area such as our
off-linetest facility ,
on-line test facility
or a dedicated out gassing chamber. Here is a
beam optics simulation
of the beam line shown above. Since the tandem accelerator
requires negative ions, a
charge exchange cell
is placed between the second and third quadruples on the platform when
positive ion sources are used.
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For questions about this page please contact the HRIBF User Liaison. This file last modified Friday August 12, 2005 | |